Challenges like higher selectivity and precise etching are critical for angstrom-scale IC production. Advanced RF pulsing and plasma control enhance precision in sub-nanometer processes. New impedance ...
DENVER--(BUSINESS WIRE)--Advanced Energy (Nasdaq: AEIS) – a global leader in highly engineered, precision power conversion, measurement, and control solutions – today expands its flagship Paramount ® ...
One very successful trick I use to simulate radiated immunity on the bench is to run an RF generator into an H-field (loop) probe. The best level seems to be +15 to +20 dBm. This will generate an ...
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