Released every 12 to 18 months, 3D NAND scaling outpaces most other semiconductor devices in replacement rate and performance ...
After years in R&D, a technology called cryogenic etch is re-emerging as a possible option for production as the industry faces new challenges in memory and logic. Cryogenic etch removes materials in ...
The fundamentals of a good Bosch etching system are described below; There are a number of significant features of the equipment used for Bosch processing which differ from normal ICP systems: In ...
A large-scale (4-inch), highly uniform, and defect-free plasma etching technology, which will likely become the foundation of the industrial supply of molybdenum disulfide (MoS₂), a next-generation ...
AZoMaterials interviews Matt Wilding about how the EP-Replayer enables users to simulate previous etch runs in real time, helping them optimize End Point detection methods, and more. Can you start by ...
Whether Samsung still uses this particular apparatus is unknown, but vacuum chambers are necessary during the dry etching process due to the plasma. Types of etching Samsung describes wet etching as ...
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